Dichroic filters for extreme ultraviolet
Edmund Optics (EO) has added new optics designed for extreme ultraviolet (EUV) to its portfolio. This product expansion includes, for example, dichroic filters for EUV suitable for generating high harmonics (HHG), as well as for the ever-growing number of related applications such as coherent diffractive imaging (CDI), EUV lithography, nanomaterials processing, and the generation of ultrashort attosecond pulses.

Extreme ultraviolet dichroic filters, also referred to as beam separators or dichroic beamsplitters, have a bandwidth of 5 to 40 nm and high separation efficiency between EUV and NIR wavelengths. They are made of fused silica substrates and can therefore withstand higher laser powers than, for example, Brewster angle beam separators or other EUV filters.
The filter series is the latest addition to Edmund Optics' stocked EUV optics, enabling rapid prototyping, product development and research. The rapid availability of the optics allows optics integrators to avoid the otherwise long lead times associated with EUV optics production.











