Apochromatically corrected wide-field microscope objective

© Excelitas

With a high numerical aperture of 0.28 and a working distance of 34 mm, it enables resolutions of up to 1 µm. The lens offers uniform imaging performance over a large field of view and supports sensors with diagonals over 30 mm. It is ideal for applications in the semiconductor back-end process, electronics inspection and demanding research tasks where image quality and high throughput are critical.

The optimized design ensures homogeneous resolution and high contrast across the entire image field. The objective is compatible with various microscopy systems, including Optem FUSION from Excelitas, and offers a parfocal distance of 95 mm.