Applied Materials and the Fraunhofer Institute for Photonic Microsystems IPMS today announced a collaboration to establish one of the largest technology centers for semiconductor metrology and process analysis in Europe. The technology center, which will be located at the Center Nanoelectronic Technologies (CNT) of the Fraunhofer IPMS in Dresden, is located in the heart of Silicon Saxony, the largest semiconductor cluster in Europe.

The technology center will be equipped with state-of-the-art Applied Materials eBeam metrology equipment, including the VeritySEM CD-SEM system (a scanning electron microscope for critical dimensions), and will be overseen by Applied Materials engineers and R&D professionals. "Fraunhofer IPMS and its partners will benefit from access to Applied's industry-leading eBeam metrology systems," said Dr. Benjamin Uhlig-Lilienthal, head of the Next Generation Computing business unit at Fraunhofer IPMS.

Metrology is critical in the manufacture of microchips as it enables the precise measurements required to accurately monitor and control the quality of each step and flow in semiconductor manufacturing. Chip manufacturers use measuring devices at critical points to validate the physical and electrical properties and to ensure the desired yield.