The manufacturer is the Jena based e-beam technology specialist Vistec Electron Beam. The system will be delivered at the beginning of 2025. This type of electron-beam lithography system can “write” structures with a precision in the ten-nanometer range on substrates up to 300 mm in diameter.

The Vistec SB3050-2 electron-beam lithography system is based on the so-called variable shaped beam-principle, with which even large areas can be structured accurately and effectively. The high degree of automation, combined with flexibility in terms of usable substrates, are further features of the Vistec SB3050-2 that enable it to be used in an industrial environment. The system is equipped with Cell Projection functionality, opening up further possibilities for applications in micro-optics.

With the new high-tech fab at Airportpark Dresden, the company is consolidating its production, which is currently spread across several small external sites, while at the same time expanding its capacities. The clean room production in the new fab will cover 2,000 square meters with clean room areas of classes ISO 5 and 3 and meet the highest requirements for freedom from vibrations and temperature stability.

According to the company high environmental standards are taken into account for the entire fab: Jenoptik is striving to fulfill the currently most comprehensive and stringent building criteria in terms of sustainability with the “KfW 40 Standard” and the “LEED Gold Standard Certification”.

Further reading: M. Hädrich (Vistec Electron Beam), T. Siefke (Jena University) , M. Banasch (Vistec Electron Beam), and U. D. Zeitner (Fraunhofer IOF): Optical metasurfaces made by cell projection lithography – Electron beam nanopatterning with high optical quality on large areas, PhotonicsViews 20(5), October/November 2022; DOI: 10.1002/phvs.202200036 (online open) • Jenoptik invests more than 70 million euros  wileyindustrynews.com, 08 September 2022