Imec and ASML announce that they intend to intensify their collaboration in the next phase of developing a state-of-the-art high numerical aperture (high NA) extreme ultraviolet (EUV) lithography pilot line at Imec.

The pilot line is intended to help the industries using semiconductor technologies to understand the opportunities that advanced semiconductor technology can bring and have access to a prototyping platform that will support their innovations. The collaboration between Imec, ASML and other partners will enable the exploration of novel semiconductor applications, the potential development of sustainable, leading-edge manufacturing solutions for chip makers and end users, as well as the development of advanced holistic patterning flows in collaboration with the equipment and material ecosystem.

The memorandum of understanding signed today includes the installment and service of ASML’s full suite of advanced lithography and metrology equipment in the Imec pilot line in Leuven, Belgium.